Microlithography: Science and Technology Second Edition (Opitcal Science and Engineering)

Description

Microlithography: Science and Technology Second Edition (Opitcal Science and Engineering)
Publisher:TF-CRC(2007-05-11) | ISBN-10:0824790243 | PDF | 7.3 Mb | 864 page
Like the bestselling original, this second edition of Microlithography is a self-contained text detailing both elementary and advanced aspects of submicron microlithography, offering a balanced treatment of theoretical and operating practices. Reflecting recently developed technologies, this edition includes coverage of immersion lithography, extreme ultraviolet (EUV) lithography, imprint lithography, photoresists for 193nm and immersion lithography, and scatterometry. The authors cover mechanical systems, optics, excimer laser light sources, and alignment techniques and analysis, as well as resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, and metrology

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