Microlithography: Science and Technology Second Edition

Category: Technical

Tag: Science/Engineering


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Description


Microlithography: Science and Technology Second Edition

 

Publisher:   TF-CRC
Number Of Pages:   864
Publication Date:   2007-05-11
Sales Rank:   668270
ISBN / ASIN:   0824790243
EAN:   9780824790240
Binding:   Hardcover
Manufacturer:   TF-CRC
Studio:   TF-CRC
Average Rating:   5


Like the bestselling original, this second edition of Microlithography is a self-contained text detailing both elementary and advanced aspects of submicron microlithography, offering a balanced treatment of theoretical and operating practices. Reflecting recently developed technologies, this edition includes coverage of immersion lithography, extreme ultraviolet (EUV) lithography, imprint lithography, photoresists for 193nm and immersion lithography, and scatterometry. The authors cover mechanical systems, optics, excimer laser light sources, and alignment techniques and analysis, as well as resist chemistry, processing, multilayer lithography, plasma and reactive ion etching, and metrology.

 
Review:

A quick review

A great book that gives a quick overview from contact printing and projection aligners (1970's and early 1980's technology), but it spends most of its time and effort on the more recent (2000's) technology and processes. There was information packed into each page, providing both an overview and detail into the more recent development of lithography. It helps to have some previous exposure to lithography as well as the topics of physics, optics, and chemistry since the book will build on all of these subjects to provide the basis of the newer technology.

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